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Yilun Liu 《Journal of the mechanics and physics of solids》2011,59(8):1613-1622
Graphene nanostrips with single or few layers can be used as bending resonators with extremely high sensitivity to environmental changes. In this paper we report molecular dynamics (MD) simulation results on the fundamental and secondary resonant frequencies f of cantilever graphene nanostrips with different layer number n and different nanostrip length L. The results deviate significantly from the prediction of not only the Euler-Bernoulli beam theory (f∝nL−2), but also the Timoshenko's model. Since graphene nanostrips have extremely high intralayer Young's modulus and ultralow interlayer shear modulus, we propose a multibeam shear model (MBSM) that neglects the intralayer stretch but accounts for the interlayer shear. The MBSM prediction of the fundamental and secondary resonant frequencies f can be well expressed in the form f−fmono∝[(n-1)/n]bL−2(1−b), where fmono denotes the corresponding resonant frequency as the layer number is 1, with b=0.61 and 0.77 for the fundamental and secondary resonant modes. Without any additional parameters fitting, the prediction from MBSM agrees excellently with the MD simulation results. The model is thus of importance for designing multilayer graphene nanostrips based applications, such as resonators, sensors and actuators, where interlayer shear has apparent impacts on the mechanical deformation, vibration and energy dissipation processes therein. 相似文献
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Claire Chainais‐Hillairet Marguerite Gisclon Ansgar Jüngel 《Numerical Methods for Partial Differential Equations》2011,27(6):1483-1510
A finite‐volume scheme for the stationary unipolar quantum drift‐diffusion equations for semiconductors in several space dimensions is analyzed. The model consists of a fourth‐order elliptic equation for the electron density, coupled to the Poisson equation for the electrostatic potential, with mixed Dirichlet‐Neumann boundary conditions. The numerical scheme is based on a Scharfetter‐Gummel type reformulation of the equations. The existence of a sequence of solutions to the discrete problem and its numerical convergence to a solution to the continuous model are shown. Moreover, some numerical examples in two space dimensions are presented. © 2010 Wiley Periodicals, Inc. Numer Methods Partial Differential Eq 27: 1483–1510, 2011 相似文献
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Duy-Thach PhanGwiy-Sang Chung 《Applied Surface Science》2011,257(9):4339-4343
Zinc oxide (ZnO) thin films were deposited on unheated silicon substrates via radio frequency (RF) magnetron sputtering, and the post-deposition annealing of the ZnO thin films was performed at 400 °C, 600 °C, 800 °C, and 1000 °C. The characteristics of the thin films were investigated by X-ray diffractometry (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM). The films were then used to fabricate surface acoustic wave (SAW) resonators. The effects of post-annealing on the SAW devices are discussed in this work. Resulting in the 600 °C is determined as optimal annealing temperature for SAW devices. At 400 °C, the microvoids exit between the grains yield large root mean square (RMS) surface roughness and higher insertion losses in SAW devices. The highest RMS surface roughness, crack and residual stress cause a reduction of surface velocity (about 40 m/s) and increase dramatically insertion loss at 1000 °C. The SAW devices response becomes very weak at this temperature, the electromechanical coupling coefficient (k2) of ZnO film decrease from 3.8% at 600 °C to 1.49% at 1000 °C. 相似文献
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P. A. Tchertchian C. J. Wagner T. J. Houlahan
Jr. B. Li D. J. Sievers J. G. Eden 《等离子体物理论文集》2011,51(10):889-905
Coupling electron‐hole (e–‐ h+) and electron‐ion plasmas across a narrow potential barrier with a strong electric field provides an interface between the two plasma genres and a pathway to electronic and photonic device functionality. The magnitude of the electric field present in the sheath of a low temperature, nonequilibrium microplasma is sufficient to influence the band structure of a semiconductor region in immediate proximity to the solid‐gas phase interface. Optoelectronic devices demonstrated by leveraging this interaction are described here. A hybrid microplasma/semiconductor photodetector, having a Si cathode in the form of an inverted square pyramid encompassing a neon microplasma, exhibits a photosensitivity in the ~420–1100 nm region as high as 3.5 A/W. Direct tunneling of electrons into the collector and the Auger neutralization of ions arriving at the Si surface appear to be facilitated by an n ‐type inversion layer at the cathode surface resulting from bandbending by the microplasma sheath electric field. Recently, an npn plasma bipolar junction transistor (PBJT), in which a low temperature plasma serves as the collector in an otherwise Si device, has also been demonstrated. Having a measured small signal current gain hfe as large as 10, this phototransistor is capable of modulat‐ing and extinguishing the collector plasma with emitter‐base bias voltages <1 V. Electrons injected into the base when the emitter‐base junction is forward‐biased serve primarily to replace conduction band electrons lost to the collector plasma by secondary emission and ion‐enhanced field emission in which ions arriving at the base‐collector junction deform the electrostatic potential near the base surface, narrowing the potential barrier and thereby facilitating the tunneling of electrons into the collector. Of greatest significance, therefore, are the implications of active, plasma/solid state interfaces as a new frontier for plasma science. Specifically, the PBJT provides the first opportunity to control the electronic properties of a material at the boundary of, and interacting with, a plasma. By specifying the relative number densities of free (conduction band) and bound (valence band) electrons at the base‐collector interface, the PBJT's emitter‐base junction is able to dictate the rates of secondary electron emission (including Auger neutralization) at the semiconductor‐plasma interface, thereby offering the ability to vary at will the effective secondary electron emission coefficient for the base surface (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
108.
大视场星敏感器标定技术研究 总被引:7,自引:1,他引:6
大视场星敏感器光学系统,由于畸变量较大,在轨标定过程中,直接采用最小二乘最优估计(LMS)或扩展卡尔曼滤波方法(EKF)无法精确求解其标定参数。在深入分析星敏感器测量误差因素的基础上,对考虑畸变和不考虑畸变两种情况的在轨标定结果进行了仿真对比;指出了标定焦距之前需先标定光学畸变的必要性,并介绍了4种可用于在轨校正光学畸变的方法;提出先标定主点偏差,再标定光学畸变参数,最后标定焦距的标定方法。仿真结果表明,可以采用像面旋转法求取主点偏差,利用高阶多项式方法求取光学畸变参数,畸变校正后,采用LMS和EKF标定算法估计焦距,标定精度达到了3.1μm和2.2μm。对100幅模拟星图处理后,星间角距统计偏差约为传统在轨标定方法的1/10~1/8。 相似文献
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